Educação matemática pela arte
Gusmão, Lucimar Donizete
2013-08-28
Search results
13 records were found.
Relief Bragg gratings were imprinted by 248 nm interferometric excimer laser ablation on potassium ion-exchanged channel waveguides in BK-7 glass overlaid with a thin high-index InOx film. Using five pulses of energy density 60 mJ/cm2, a spectral transmittance notch of depth 66% and FWHM<0.1 nm was obtained at 1547 nm in the TE polarization for a waveguide having a nominal width of 8 µm and a 135-nm-thick InOx overlayer. In waveguides coated with 100 nm InOx, with widths increasing from 3 to 8 µm, the reflection wavelength shifted by 0.12 nm/µm and the reflectivity increased monotonically.
High quality relief gratings of period 500nm have been patterned in InOx and Ta2O5 thin films using interferometric 248nm excimer laser ablation. Details of the ablation process and the morphology of the gratings are presented.
Relief Bragg gratings were imprinted by 248 nm interferometric excimer laser ablation on potassium ion-exchanged channel waveguides in BK-7 glass overlaid with a thin high-index InOx film. Using five pulses of energy density 60 mJ/cm(2), a spectral transmittance notch of depth 66% and Delta lambda (FWHM)<0.1 nm was obtained at 1547 nm in the TE polarization for a waveguide having a nominal width of 8 mum and a 135-nm-thick InOx overlayer. In waveguides coated with 100 nm InOx, with widths increasing from 3 to 8 mum, the reflection wavelength shifted by 0.12 nm/mum and the reflectivity increased monotonically. (C) 2001 American Institute of Physics.
High quality relief gratings of period 500nm have been patterned in InOx and Ta2O5 thin films using interferometric 248nm excimer laser ablation. Details of the ablation process and the morphology of the gratings are presented.
Relief Bragg gratings were imprinted by 248nm interferometric excimer laser ablation on potassium ion-exchanged channel waveguides in BK-7 glass overlaid with athin high-index InOx film. Using five pulses of energy density 60mJ/cm2, a spectral transmittance notch of depth 66% and Δλ < 0.1nm was obtained at 1547nm in the TE polarisation for a waveguide having a nominal width of 8μm and a 135nm thick InOx overlayer. In waveguides coated with 100nm InOx, with widths increasing from 3μm to 8μm, the reflection wavelength shifted by 0.12nm/μm and the reflectivity increased monotonically.
Sub-micron relief gratings have been ablated on InOx thin films overlaid on K+ ion-exchanged waveguide channels, using 248nm excimer laser interferometry. Strong Bragg reflection has been demonstrated.
Relief gratings overlaid on optical waveguides may be used as high-extinction ratio wavelength filters with applications in integrated optics and optical communications. Cross-patterned, high contrast relief grating waveguide structures may potentially perform as 2-D photonic band gaps if properly designed and fabricated. A new waveguide grating design process which relies on a novel grating patterning method and new materials will be presented in this paper. This design consists of the combination of a potassium ion-exchanged singlemode channel waveguide with a high-index film (InOx) overlaid on its upper surface [1]. The high-index overlayer is deposited over a part of the waveguide length. A relief grating is patterned on the InOx layer using 248nm interferometric excimer laser ablation [2].
Relief gratings overlaid on optical waveguides may be used as high-extinction ratio wavelength filters with applications in integrated optics and optical communications. Cross-patterned, high contrast relief grating waveguide structures may potentially perform as 2-D photonic band gaps if properly designed and fabricated. A new waveguide grating design process which relies on a novel grating patterning method and new materials will be presented in this paper. This design consists of the combination of a potassium ion-exchanged singlemode channel waveguide with a high-index film (InOx) overlaid on its upper surface [1]. The high-index overlayer is deposited over a part of the waveguide length. A relief grating is patterned on the InOx layer using 248nm interferometric excimer laser ablation [2].
Sub-micron relief gratings have been ablated on InOx thin films overlaid on K+ ion-exchanged waveguide channels, using 248nm excimer laser interferometry. Strong Bragg reflection has been demonstrated.
Indium oxide (InOx) is being extensively used in microelectronic technology due to its important optical and electrical properties. Dynamic photorefractive behaviour of InOx exposed in the near UV region (325nm) at low intensity (~0.25W/cm) has been demonstrated for films grown by DC magnetron sputtering and Pulsed Laser Deposition
